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in Single Chamber RTP Tools
Item ID: 3502

Offered 1 Offered at Best Price

AG Associates 2101

Rapid Thermal Processing System for 3"-5" Wafers
AG Associates 2101
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Location: Plano, TX, United States
Unit Price Unstated
Number of Units 1
Manufacturer AG Associates
Model 2101
Description Rapid Thermal Processing System for 3
Other Information 
  • Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying
  • Cassette to Cassette Handling of 3”-5” Wafers
  • Microprocessor-controlled
  • 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle
  • 400-1150ºC Steady-State Temperature Range
  • 1-300 Seconds Anneal Time
  • Controlled Ambient for up to 4 Gases
Refurbished YES